WebDec 1, 2008 · The HfN thin films are around 100nm thick. characterizations, including x-ray diffraction, transmission electron microscopy (TEM), and high-resolution TEM, were … WebApr 6, 2005 · Single-phase Hf N x ( 001) is metallic with a positive temperature coefficient of resistivity (TCR) between 50 and 300 K and a temperature-independent carrier density. It is also superconducting with the highest critical temperature, 9.18 K, …
Superconductivity at 25.5 K in electron-doped layered hafnium …
WebHfN is a transition metal nitride that shows interesting mechanical and chemical properties for using electronic, mechanical, corrosion, wear areas. In this work HfN thin films were fabricated by D.C. sputtering varying nitrogen flux. The Ar/N2 ratio used inside in the deposition chamber was 10, 6.66, 5, 4 and 3.33. The obtained films were analyzed by X … WebDec 16, 2024 · The oxygen concentration inside HfN x decreased as the annealing temperature increased. HfN x films annealed under 900 °C showed dielectric properties similar to hafnium oxynitride (HfO x N y). However, films annealed over 950 °C transformed into a more electrically conducting HfN film, showing a resistivity of ∼10 6 μΩ cm. force voltage analogy problems
Cubic HfN Thin Films with Low Resistivity on Si (001) and
WebJan 8, 2004 · It is the most refractory binary compound known to man. Similarly, hafnium nitride (HfN) is the most refractory nitride known with a melting point of approximately 3305 °C. Key Properties Applications Hafnium carbide is used in hard coatings, often applied by processes such as plasma spraying. Source: AZoM.com. Download PDF Copy Request … WebJun 2, 2024 · The Co/HfN multilayer films were prepared on Si (100) and sapphire glass substrates (a resistivity value of > 10 15 μΩ·cm) in a sputtering Ar gas pressure of 6.5 × 10 −1 Pa at room temperature by sequentially sputtering a pure Co target ( dc, 30 W) and HfN target ( ac, 100 W). WebApr 25, 2024 · Silver (Ag) has the lowest resistivity (1.62 μΩ·cm, R.T.) [1] and highest optical reflectance among all metals. Therefore, Ag thin films are suitable for use as electrodes and mirrors. Common methods for Ag film deposition include sputtering, which is capable of processing large areas, and vacuum evaporation. forced draught evaporator